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專利

公開號USD592029 S1
出版類型授權
申請書編號29/295,291
發佈日期2009年5月12日
申請日期2007年9月25日
優先權日期
2004年10月26日
其他公開專利號
發明人
原專利權人
美國專利分類號
外部連結
Polishing pad
US D592029 S1
圖示(5)
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聲明
  1. The ornamental design for a polishing pad, as shown and described.

說明

FIG. 1 is a top plan view of a polishing pad showing our new design;

FIG. 2 is a front elevational view thereof, the rear elevational view, left side and right side elevational views being mirror images of the front view shown;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is a partially enlarged view of portion 44 in FIG. 1;

FIG. 5 is a partially enlarged sectional view taken substantially along line 55 in FIG. 4;

FIG. 6 is a partially enlarged sectional view taken substantially along line 66 in FIG. 4;

FIG. 7 is a partially enlarged view of portion 77 in FIG. 3;

FIG. 8 is a partially enlarged sectional view of portion 8 in FIG. 5; and,

FIG. 9 is a partially enlarged view of portion 99 in FIG. 1.