Methods that include acquiring aerial images of a reticle for different values of a member of a set of lithographic variables are provided. One method also includes determining a presence of an anomaly in a design pattern of the reticle by comparing at least one pair of the aerial images corresponding...http://www.google.com.tw/patents/US20040091142?utm_source=gb-gplus-share專利 US20040091142 - Qualifying patterns, patterning processes, or patterning apparatus in the fabrication of microlithographic patterns
