A system and method are used to limit a proportion of a programmable patterning means used to pattern a substrate. This is done such that a size of a repeated pattern to be exposed on the substrate is an integer multiple of a size of a pattern exposed on the substrate by the patterned beam....http://www.google.com.tw/patents/US7016015?utm_source=gb-gplus-share專利 US7016015 - Lithographic apparatus and device manufacturing method
