A method light enhanced atomic layer deposition for forming a film on a substrate. The method includes disposing the substrate in a process chamber of a light enhanced atomic layer deposition (LEALD) system configured to perform a LEALD process; and depositing a film on the substrate using the LEALD...http://www.google.com.tw/patents/US7727912?utm_source=gb-gplus-share專利 US7727912 - Method of light enhanced atomic layer deposition
